Preparation and Electrical Properties of V2O3 Single Crystals of Controlled Stoichiometry
- S.A. Shivashankar
- R. Aragón
- et al.
- 2019
- JES
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Low Energy Ion Beam Etching
- J.M.E. Harper
- J.J. Cuomo
- et al.
- 2019
- JES
All Dry Lithography Processes and Mechanistic Studies with Poly(methacrylonitrile) and Related Polymers
- H. Hiraoka
- 2019
- JES
One-Micron Polycide (WSI2 on Poly-Si) MOSFET Technology
- M.Y. Tsai
- H.H. Chao
- et al.
- 2019
- JES
An electron microscope investigation of the effect of phosphorous doping on the plasma etching of polycrystalline silicon
- E.A. Irene
- E. Tierney
- et al.
- 2019
- JES
Parameter Dependence of RIE Induced Radiation Damage in Silicon Dioxide
- L.M. Ephrarh
- D.J. Dimaria
- et al.
- 2019
- JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: I. The Pressure Range Below 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES
Plasma Oxide FET Devices
- A. Ray
- A. Reisman
- 2019
- JES
Luminescence of Silica Glasses Containing Copper
- J.M. Brownlow
- I.F. Chang
- 2019
- JES
The Formation of SiO2 in an RF Generated Oxygen Plasma: II. The Pressure Range Above 10 mTorr
- A. Ray
- A. Reisman
- 2019
- JES