Publications

358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Quantum size effects in ultrathin Cu(100) films
- - G.J. Mankey
  - R.F. Willis
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas
- - O. Joubert
  - G.S. Oehrlein
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Fluorocarbon high density plasmas. VIII. Study of the ion flux composition at the substrate in electron cyclotron resonance etching processes using fluorocarbon gases
- - Gottlieb S. Oehrlein
  - Ying Zhang
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Role of ions in reactive ion etching
- - J.W. Coburn
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Modification of the PHI sample mount for multiple- or micropositioning for Zalar rotation
- - Paul Soo
  - David L. Neiman
  - et al.
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Langmuir probe measurements of a radio frequency induction plasma
- - J. Hopwood
  - C.R. Guarnieri
  - et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Molecular Dynamics Modeling of Microstructure and Stresses in Sputter-Deposited Thin Films
- - F. Jones
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Selective reactive ion etching of phosphorus-doped oxide over undoped SiO₂
- - David Vender
  - Gottlieb S. Oehrlein
  - et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Electromagnetic fields in a radio-frequency induction plasma
- - J. Hopwood
  - C.R. Guarnieri
  - et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive Ion Etching of Sige Alloys using Fluorine-Containing Plasmas *
- - James W. Corbett
  - Gottlieb S. Oehrlein
  - et al.
- 1993
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films