Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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357 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Transfer etching of bilayer resists in oxygen-based plasmas
- - A. Mahorowala
  - K. Babich
  - et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Reactive ion etch of 150 nm Al lines for interconnections in dynamic random access memory
- - G. Stojakovic
  - X.J. Ning
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Current-induced nanochemistry: Local oxidation of thin metal films
- - R. Martel
  - Th. Schmidt
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Patterning of NiFe and NiFeCo in CO/NH₃ high density plasmas
- - K.B. Jung
  - J. Hong
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Plasma induced copolymerization of hexafluoropropylene and octafluoropropane
- - Pieter B. Leezenberg
  - Timothy C. Reiley
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Investigation of slider surfaces after wear using photoemission electron microscopy
- - Simone Anders
  - Thomas Stammler
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High resolution x-ray photoelectron spectroscopy and INDO/S-CI study of the core electron shakeup states of pyromellitic dianhydride-4,4′-oxydianiline polyimide
- - Y. Nakayama
  - P. Persson
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Interdiffusion studies of single crystal TiN/NbN superlattice thin films
- - C. Engström
  - J. Birch
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Enhanced secondary electron yield from oxidized regions on amorphous carbon films studied by x-ray spectromicroscopy
- - Javier Diaz
  - Simone Anders
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Comparison of Cl₂ and F₂ based chemistries for the inductively coupled plasma etching of NiMnSb thin films
- - J. Hong
  - J.A. Caballero
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films