The nature of the dominant deep trap in amorphous silicon nitride films: Evidence for a negative correlation energy
- P. Lenahan
- D.T. Krick
- et al.
- 1989
- Applied Surface Science
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93 results at Applied Surface Science
Plasma-enhanced CVD of high quality insulating films
- J. Batey
- E. Tierney
- et al.
- 1989
- Applied Surface Science
Electron spin resonance study of metal-nitride-silicon structures: Observation of Si dangling bonds with different configurations and trapping properties in silicon nitride
- D. Jousse
- Jerzy Kanicki
- et al.
- 1989
- Applied Surface Science
Gate materials consideration for submicron CMOS
- C.-Y. Ting
- B. Davari
- 1989
- Applied Surface Science
Some properties of CrxV1-xSi2 and CrxMo1-xSi2 thin films
- O. Thomas
- Steve Molis
- et al.
- 1989
- Applied Surface Science
Coulombic and neutral electron trapping centers in SiO2
- D.A. Buchanan
- M.V. Fischetti
- et al.
- 1989
- Applied Surface Science
Size dependence of chemisorptive properties based on surface cluster models: CO/Cu(100) and CO/Al(100)
- K. Hermann
- P.S. Bagus
- 1988
- Applied Surface Science
XPS oxidation study of TbFeCo films
- D.C. Miller
- E.E. Marinero
- et al.
- 1988
- Applied Surface Science
Hot electrons in silicon dioxide: Ballistic to steady-state transport
- D.J. DiMaria
- M.V. Fischetti
- 1987
- Applied Surface Science
High temperature reaction and defect chemistry at the Si/SiO2 interface
- K. Hofmann
- G.W. Rubloff
- et al.
- 1987
- Applied Surface Science