Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's
- Alan E. Rosenbluth
- David Melville
- et al.
- 2007
- SPIE Advanced Lithography 2007
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19 results at SPIE Advanced Lithography 2007
Modeling polarization for Hyper-NA lithography tools and masks
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2007
- SPIE Advanced Lithography 2007
Use of starburst patterns in optical lithography
- M. Burkhardt
- Cyrus Tabery
- 2007
- SPIE Advanced Lithography 2007
Coupling-aware mixed dummy metal insertion for lithography
- Liang Deng
- Martin D.F. Wong
- et al.
- 2007
- SPIE Advanced Lithography 2007
Fluoroalcohol materials with tailored interfacial properties for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2007
- SPIE Advanced Lithography 2007
High performance 193nm photoresists based on fluorosulfonamide
- Wenjie Li
- Kuang-Jung Chen
- et al.
- 2007
- SPIE Advanced Lithography 2007
Improving the power-performance of multicore processors through optimization of lithography and thermal processing
- A. Gabor
- T.A. Brunner
- et al.
- 2007
- SPIE Advanced Lithography 2007
Self-aligned, self-assembled organosilicate line patterns of ∼20nm half-pitch from block copolymer mediated self-assembly
- Ho-Cheol Kim
- Joy Cheng
- et al.
- 2007
- SPIE Advanced Lithography 2007
Building an immersion top coat from the ground up - Materials perspective
- Mahmoud Khojasteh
- Irene Popova
- et al.
- 2007
- SPIE Advanced Lithography 2007
Initial experience establishing a EUV baseline lithography process for manufacturability assessment
- O.R. Wood II
- D. Back
- et al.
- 2007
- SPIE Advanced Lithography 2007