Reactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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11 results at Microlithography 1998
New approaches to production-worthy 193-nm photoresists based on acrylic copolymers
- Thomas I. Wallow
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Extension of 248 nm optical lithography: A thin film imaging approach
- Qinghuang Lin
- Ahmad D. Katnani
- et al.
- 1998
- Microlithography 1998
Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm
- Juliann Opitz
- Robert D. Allen
- et al.
- 1998
- Microlithography 1998
Advanced negative resists using novel aminoplast crosslinkers
- Ali Afzali-Kushaa
- Jeffrey D. Gelorme
- et al.
- 1998
- Microlithography 1998
Design of an etch-resistant cyclic olefin photoresist
- Robert D. Allen
- Juliann Opitz
- et al.
- 1998
- Microlithography 1998
Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers
- Wu-Song Huang
- Ratnam Sooriyakumaran
- et al.
- 1998
- Microlithography 1998
Probabilistic model for the mechanism of phenolic polymer dissolution
- Lewis W. Flanagin
- Christopher L. McAdams
- et al.
- 1998
- Microlithography 1998
Effects of underlayer on performance of bilayer resists for 248-nm lithography
- Katherina Babich
- Alessandro Callegari
- et al.
- 1998
- Microlithography 1998
Positive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998