Simulation of photoresist defect transfer through subsequent patterning processes
- Dominik Metzler
- Mohamed Oulmane
- et al.
- 2020
- SPIE Advanced Lithography 2020
Publications
Date
Featured collections
Popular topics
12 results at SPIE Advanced Lithography 2020
Bayesian dropout approximation in deep learning neural networks: Analysis of self-aligned quadruple patterning
- Scott D. Halle
- Max O. Bloomfield
- et al.
- 2020
- SPIE Advanced Lithography 2020
Hydrocarbon layer formation and removal studies on SiN films etched in halogen/hydrofluorocarbon plasmas
- L. Buzi
- J. M. Papalia
- et al.
- 2020
- SPIE Advanced Lithography 2020
Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features
- A. Dutta
- Jennifer Church
- et al.
- 2020
- SPIE Advanced Lithography 2020
Leveraging sub-E0 dose assessment methodology to improve EUV lithography cluster dose performance
- Chris Robinson
- Cody Murray
- et al.
- 2020
- SPIE Advanced Lithography 2020
EUVL mask process development and verification using advanced modeling and characterization techniques
- Michael Green
- Romain Lallement
- et al.
- 2020
- SPIE Advanced Lithography 2020
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
- Jennifer Church
- Luciana Meli
- et al.
- 2020
- SPIE Advanced Lithography 2020
Line top loss and line top roughness characterizations of EUV resists
- Daniel Schmidt
- Karen Petrillo
- et al.
- 2020
- SPIE Advanced Lithography 2020
EUV chemically amplified resist component distribution and efficiency for stochastic defect control
- Dario Goldfarb
- Olivia Wang
- et al.
- 2020
- SPIE Advanced Lithography 2020
AFM characterization for Gate-All-Around (GAA) devices
- Mary Breton
- Jennifer Fullam
- et al.
- 2020
- SPIE Advanced Lithography 2020