The Viability of HFO-1234ze(E) (trans-1,3,3,3-Tetrafluoropropene) as a Low Global Warming Potential Silicon Dioxide Etch Gas
- Aaron Windsor
- Jeremy Clark
- et al.
- 2025
- JVSTB
Publications
Date
Featured collections
Popular topics
24 results at JVSTB
New approach of local critical dimension uniformity improvement for via/contact hole etch with direct current superposition
- Emilia W. Hirsch
- Dominik Metzler
- et al.
- 2024
- JVSTB
Mid-IR and UV-Vis-NIR Mueller matrix ellipsometry characterization of tunable hyperbolic metamaterials based on self-assembled carbon nanotubes
- Stefan Schöche
- Po Hsun Ho
- et al.
- 2020
- JVSTB
Nitride etching with hydrofluorocarbons. II. Evaluation of C4H9F for tight pitch Si3N4 patterning applications
- Nathan Marchack
- Hiroyuki Miyazoe
- et al.
- 2018
- JVSTB
Nitride etching with hydrofluorocarbons III: Comparison of C4H9F and CH3F for low-k′ nitride spacer etch processes
- Hiroyuki Miyazoe
- Nathan Marchack
- et al.
- 2018
- JVSTB
Extreme-low k porous pSiCOH dielectrics prepared by PECVD
- H. You
- Petra Mennell
- et al.
- 2018
- JVSTB
Nitride etching with hydrofluorocarbons. I. Selective etching of nitride over silicon and oxide materials by gas discharge optimization and selective deposition of fluorocarbon polymer
- Sebastian U. Engelmann
- Robert L. Bruce
- et al.
- 2017
- JVSTB
Optimized process for fabrication of free-standing silicon nanophotonic devices
- Paul Seidler
- 2017
- JVSTB
Advanced single precursor based pSiCOH k = 2.4 for ULSI interconnects
- Deepika Priyadarshini
- Son Van Nguyen
- et al.
- 2017
- JVSTB
Study of phosphorus doped Si:C films formed by in situ doped Si epitaxy and implantation process for n-type metal-oxide-semiconductor devices
- Shogo Mochizuki
- Rainer Loesing
- et al.
- 2017
- JVSTB