Trilayer process for T -gate and Γ-gate lithography using ternary developer and proximity effect correction superposition
- Leonidas E. Ocola
- James Bucchignano
- et al.
- 2022
- Journal of Vacuum Science and Technology B
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17 results at Journal of Vacuum Science and Technology B
Reliability and resistance projections for rhodium and iridium interconnects from first-principles
- Nicholas A. Lanzillo
- Daniel C. Edelstein
- 2022
- Journal of Vacuum Science and Technology B
Plasma-based area selective deposition for extreme ultraviolet resist defectivity reduction and process window improvement
- Katie Lutker-Lee
- Jennifer Church
- et al.
- 2022
- Journal of Vacuum Science and Technology B
In-depth feasibility study of extreme ultraviolet damascene extension: Patterning, dielectric etch, and metallization
- Xinghua Sun
- Yann Mignot
- et al.
- 2022
- Journal of Vacuum Science and Technology B
Pulsed-laser atom probe tomography of p-type field effect transistors on Si-on-insulator substrates
- S. Jin
- K.S. Jones
- et al.
- 2011
- Journal of Vacuum Science and Technology B
Increasing the speed of solid-state nanopores
- Philip S. Waggoner
- Aaron T. Kuan
- et al.
- 2011
- Journal of Vacuum Science and Technology B
Mechanism of VFB / VTH shift in Dysprosium incorporated HfO2 gate dielectric n-Type Metal-Oxide-Semiconductor devices
- Tackhwi Lee
- Kisik Choi
- et al.
- 2011
- Journal of Vacuum Science and Technology B
Suppression of boron diffusion in deep submicron devices
- Michael A. Gribelyuk
- Phil Oldiges
- et al.
- 2011
- Journal of Vacuum Science and Technology B
Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems
- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2011
- Journal of Vacuum Science and Technology B
High quality epitaxial Dy3 Ge5 films grown on Ge(001) substrates
- Md. Nurul Kabir Bhuiyan
- Mariela Menghini
- et al.
- 2011
- Journal of Vacuum Science and Technology B