Allen Gabor

Title

Distinguished Engineer

Bio

Allen Gabor is a Senior Technical Staff Member at IBM. He has worked in the field of lithography at Arch Chemicals, GlobalFoundries and IBM. This work has included photoresist development, CD control, overlay minimization and 193 dry, immersion and EUV insertion. He received his PhD (1996) in Materials Science and Engineering from Cornell University based on his work on block copolymer photoresists. He is the author of more than 50 journal papers and holder of over 30 patents. He currently serves on the program committee for SPIE Extreme Ultraviolet (EUV) Lithography Conference and is a senior member of SPIE.

Publications

A high performance 90 nm SOI technology with 0.992 μm² 6T-SRAM cell
- - Mukesh Khare
  - S. Ku
  - et al.
- 2002
- IEDM 2002
Enabling the 70 nm technology node with 193 nm altPSM lithography
- - Lars Liebmann
  - Jennifer Lund
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Imaging polymers with supercritical carbon dioxide
- - Christopher K. Ober
  - Allen H. Gabor
  - et al.
- 1997
- Advanced Materials

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Patents

- 29 Mar 2011
- US
- 7914975
Multiple Exposure Lithography Method Incorporating Intermediate Layer Patterning
- 22 Sep 2010
- CN
- ZL200910002332.2
Methods For Forming A Composite Pattern Including Printed Resolution Assist Features
- 21 Sep 2010
- US
- 7799503
Composite Structures To Prevent Pattern Collapse
- 01 Jun 2010
- US
- 7727825
Polyconductor Line End Formation And Related Mask
- 02 Jun 2009
- US
- 7541613
Methods For Reducing Within Chip Device Parameter Variations
- 17 Feb 2009
- US
- 7493186
Method And Algorithm For The Control Of Critical Dimensions In A Thermal Flow Process
- 03 Feb 2009
- US
- 7485573
Process Of Making A Semiconductor Device Using Multiple Antireflective Materials
- 20 Jan 2009
- US
- 7479355
Mask Design For Enhancing Line End Resolution
- 16 Dec 2008
- US
- 7465615
Polyconductor Line End Formation And Related Mask
- 01 Jul 2008
- US
- 7393703
Method For Reducing Within Chip Device Parameter Variations

Top collaborators

Allen Gabor

Title

Bio

Publications

A high performance 90 nm SOI technology with 0.992 μm² 6T-SRAM cell

Enabling the 70 nm technology node with 193 nm altPSM lithography

Imaging polymers with supercritical carbon dioxide

Patents

Multiple Exposure Lithography Method Incorporating Intermediate Layer Patterning

Methods For Forming A Composite Pattern Including Printed Resolution Assist Features

Composite Structures To Prevent Pattern Collapse

Polyconductor Line End Formation And Related Mask

Methods For Reducing Within Chip Device Parameter Variations

Method And Algorithm For The Control Of Critical Dimensions In A Thermal Flow Process

Process Of Making A Semiconductor Device Using Multiple Antireflective Materials

Mask Design For Enhancing Line End Resolution

Polyconductor Line End Formation And Related Mask

Method For Reducing Within Chip Device Parameter Variations

Top collaborators

Nelson Felix

Luciana Meli

Mary Breton