Allen Gabor

Title

Distinguished Engineer

Bio

Allen Gabor is a Senior Technical Staff Member at IBM. He has worked in the field of lithography at Arch Chemicals, GlobalFoundries and IBM. This work has included photoresist development, CD control, overlay minimization and 193 dry, immersion and EUV insertion. He received his PhD (1996) in Materials Science and Engineering from Cornell University based on his work on block copolymer photoresists. He is the author of more than 50 journal papers and holder of over 30 patents. He currently serves on the program committee for SPIE Extreme Ultraviolet (EUV) Lithography Conference and is a senior member of SPIE.

Publications

A high performance 90 nm SOI technology with 0.992 μm² 6T-SRAM cell
- - Mukesh Khare
  - S. Ku
  - et al.
- 2002
- IEDM 2002
Enabling the 70 nm technology node with 193 nm altPSM lithography
- - Lars Liebmann
  - Jennifer Lund
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Imaging polymers with supercritical carbon dioxide
- - Christopher K. Ober
  - Allen H. Gabor
  - et al.
- 1997
- Advanced Materials

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Patents

- 31 Jan 2022
- US
- 11239077
Litho-etch-litho-etch With Self-aligned Blocks
- 25 Mar 2019
- US
- 10242952
Registration Mark Formation During Sidewall Image Transfer Process
- 06 Aug 2018
- US
- 10043760
Registration Mark Formation During Sidewall Image Transfer Process
- 01 Jan 2018
- US
- 9859224
Registration Mark Formation During Sidewall Image Transfer Process
- 17 Oct 2016
- US
- 9472506
Registration Mark Formation During Sidewall Image Transfer Process
- 02 Jun 2015
- US
- 9046788
Method For Monitoring Focus On An Integrated Wafer
- 30 Sep 2014
- US
- 8847416
Multi-layer Chip Overlay Target And Measurement
- 18 Mar 2014
- US
- 8673165
Sidewall Image Transfer Process With Multiple Critical Dimensions
- 17 Dec 2013
- US
- 8609322
Process Of Making A Lithographic Structure Using Antireflective Materials
- 26 Nov 2013
- US
- 8592110
Alignment Marks For Multi-exposure Lithography

Top collaborators

Allen Gabor

Title

Bio

Publications

A high performance 90 nm SOI technology with 0.992 μm² 6T-SRAM cell

Enabling the 70 nm technology node with 193 nm altPSM lithography

Imaging polymers with supercritical carbon dioxide

Patents

Litho-etch-litho-etch With Self-aligned Blocks

Registration Mark Formation During Sidewall Image Transfer Process

Registration Mark Formation During Sidewall Image Transfer Process

Registration Mark Formation During Sidewall Image Transfer Process

Registration Mark Formation During Sidewall Image Transfer Process

Method For Monitoring Focus On An Integrated Wafer

Multi-layer Chip Overlay Target And Measurement

Sidewall Image Transfer Process With Multiple Critical Dimensions

Process Of Making A Lithographic Structure Using Antireflective Materials

Alignment Marks For Multi-exposure Lithography

Top collaborators

Nelson Felix

Luciana Meli

Mary Breton