J. Yuan, S.S. Tan, et al.
VLSI Technology 2006
We report, for the first time, a detailed study of Infra-Die Variation (IDV) of CMOS inverter delay for the 65nm technology, driven by mm-scale variations of rapid thermal annealing (RTA). We find that variation in V T and REXT accounts for most of the IDV in delay and leakage and is modulated by lamp RTA ramp rate. We show a good correlation of inverter delay to mm-scale variation in the predicted reflectivity of the device pattern densities. CMOS, RTA, Variation, and Ramp Rate © 2006 IEEE.
J. Yuan, S.S. Tan, et al.
VLSI Technology 2006
H. Shang, L. Chang, et al.
VLSI Technology 2006
X. Yu, Oleg Gluschenkov, et al.
IEDM 2011
R.S. Shenoy, K. Gopalakrishnan, et al.
VLSI Technology 2006