High performance 14nm SOI FinFET CMOS technology with 0.0174μm2 embedded DRAM and 15 levels of Cu metallization
- C.-H.C-H. Lin
- Brian Greene
- et al.
- 2014
- IEDM 2014
Bio
Allen Gabor is a Senior Technical Staff Member at IBM. He has worked in the field of lithography at Arch Chemicals, GlobalFoundries and IBM. This work has included photoresist development, CD control, overlay minimization and 193 dry, immersion and EUV insertion. He received his PhD (1996) in Materials Science and Engineering from Cornell University based on his work on block copolymer photoresists. He is the author of more than 50 journal papers and holder of over 30 patents. He currently serves on the program committee for SPIE Extreme Ultraviolet (EUV) Lithography Conference and is a senior member of SPIE.
Publications
Advanced overlay control in volume manufacturing
- Timothy Wiltshire
- Christopher Ausschnitt
- et al.
- 2011
- ASMC 2011
Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- 2011
- SPIE Advanced Lithography 2011
Smaller, smarter, faster, and more accurate: The new overlay metrology
- 2010
- SPIE Advanced Lithography 2010
Measuring layer-specific depth-of-focus requirements
- Bernhard Liegl
- Allen Gabor
- et al.
- 2008
- SPIE Advanced Lithography 2008
Improving the power-performance of multicore processors through optimization of lithography and thermal processing
- A. Gabor
- T.A. Brunner
- et al.
- 2007
- SPIE Advanced Lithography 2007
Patterning strategies for gate level tip-tip distance reduction in SRAM cell for 45nm and beyond
- Haoren Zhuang
- Helen Wang
- et al.
- 2007
- ISTC 2007
High performance 45-nm SOI technology with enhanced strain, porous low-k BEOL, and immersion lithography
- S. Narasimha
- K. Onishi
- et al.
- 2006
- IEDM 2006
RTA-driven intra-die variations in stage delay, and parametric sensitivities for 65nm technology
- I. Ahsan
- N. Zamdmer
- et al.
- 2006
- VLSI Technology 2006
Silicon containing polymer in applications for 193 nm high NA lithography processes
- Scan Bums
- Dirk Pfeiffer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Patents
- US
- 11239077
- US
- 10242952
- US
- 10043760
- US
- 9859224
- US
- 9472506
- US
- 9046788
- US
- 8847416
- US
- 8673165
- US
- 8609322
- US
- 8592110
Top collaborators
NF
Nelson Felix
Director, Techinical Business Development - IBM Semiconductors
LM
Luciana Meli
Senior Manager: Patterning & Metrology
MB
Mary Breton
Technical Assistant to Huiming Bu | Semiconductor Enablement Program Management & Infrastructure