Julien Frougier

Publications

• Optimization of 3nm High Performance Nanosheet Technology for 77 K Operation

  • • Julien Frougier
    • Ruqiang Bao
    • et al.
  • 2025
  • GOMACTech 2025

• Novel ellipsometry-based machine learning technique for characterization of low sensitivity critical dimensions within gate-all-around transistors

  • • Houssam Chouaib
    • Valeria Dimastrodonato
    • et al.
  • 2024
  • SPIE Advanced Lithography + Patterning 2024

• Scaling opportunities for Gate-All-Around and beyond: A patterning perspective

  • • Indira Seshadri
    • Eric Miller
    • et al.
  • 2023
  • IEDM 2023

• Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement

  • • Daniel Schmidt
    • Aron Cepler
    • et al.
  • 2022
  • IEEE Trans Semicond Manuf

• Highly Selective SiGe Dry Etch Process for the Enablement of Stacked Nanosheet Gate-All-Around Transistors

  • • Curtis Durfee
    • Subhadeep Kal
    • et al.
  • 2021
  • ECS Meeting 2021

• Nanosheet Metrology Opportunities for Technology Readiness

  • • Mary Breton
    • Daniel Schmidt
    • et al.
  • 2021
  • SPIE Advanced Lithography 2021