Ravi Bonam, R. Muthinti, et al.
SPIE Advanced Lithography 2017
Direct Optimization (DO) of a 3D DSA model is a more optimal approach to a DTCO study in terms of accuracy and speed compared to a Cahn Hilliard Equation solver. DO's shorter run time (10X to 100X faster) and linear scaling makes it scalable to the area required for a DTCO study. However, the lack of temporal data output, as opposed to prior art, requires a new calibration method. The new method involves a specific set of calibration patterns. The calibration pattern's design is extremely important when temporal data is absent to obtain robust model parameters. A model calibrated to a Hybrid DSA system with a set of device-relevant constructs indicates the effectiveness of using nontemporal data. Preliminary model prediction using programmed defects on chemo-epitaxy shows encouraging results and agree qualitatively well with theoretical predictions from a strong segregation theory.
Ravi Bonam, R. Muthinti, et al.
SPIE Advanced Lithography 2017
Chi Chun Liu, Richard Farrell, et al.
MEMS/NEMS/MOEMS 2019
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011