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VLSI Technology 2010
A significant increase in parasitic resistance (R PARA) fluctuation is observed when S/D length is getting smaller than the characteristic length (L TRANS). Resistance change evaluated on double gate finFETs with various fin lengths shows an excellent agreement between the experimental data and the analytical model. Further R PARA fluctuation improvement can be realized by optimizing the L TRANS. © 2011 IEEE.
Veeraraghvan S. Basker, Theodorus E. Standaert, et al.
VLSI Technology 2010
Kingsuk Maitra, Ali Khakifirooz, et al.
IEEE Electron Device Letters
Youngseok Kim, S. Kim, et al.
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