Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
ESD robustness of 4 kV HBM is achieved in CMOS-on-SOI ESD protection networks in an advanced sub-0.25 μm mainstream CMOS-on-SOI technology. Design layout, body contact, floating-gate effects and novel ESD protection implementations are discussed. © 1998 Elsevier Science B.V.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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Physical Review B
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SCML 2024