F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
A combinatorial research methodology was presented for investigating material factors in photoresist formulation more rapidly with respect to traditional experimental design. The major advantage of combinatorial methodology is its ability to generate data over a wide range of system variables simultaneously. It is shown that the combinatorial technique generates both temperature and time gradients in polymer films.
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters
D.D. Awschalom, J.-M. Halbout
Journal of Magnetism and Magnetic Materials
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007