Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
Tensile-strained Si on relaxed Si1-xGex buffers has emerged as an important channel material for improving CMOS performance. The ability of tensile-strained Si to dramatically improve MOSFET drive currents has received much attention in the literature in recent years, but little is known about its reliability characteristics. In this review we discuss some of the issues that should be considered in the analysis of hot-electron reliability of strained Si n-channel MOSFETs. © 2005 Elsevier Ltd. All rights reserved.
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997