Conference paper
A survey of defects in strained Si layers
S.W. Bedell, H. Chen, et al.
MRS Proceedings 2004
A flexible imprinter can be used to accommodate substrate or template roughness in nanoimprint lithography. The contact mechanics of a multi-layer imprinter incorporating bending and local deformation is described. With the right combination of dimensions, moduli, and viscosity, the imprinter can transfer a pattern evenly to a non-flat substrate. These concepts have been used to pattern magnetic media for high density information storage. © 2005 Springer Science+Business Media. Inc.
S.W. Bedell, H. Chen, et al.
MRS Proceedings 2004
H.A. Michelsen, C.T. Rettner, et al.
Physical Review Letters
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
A. Ignatiev, F. Jona, et al.
Surface Science