R. Ludeke, M.T. Cuberes, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Inversion charge pumping was introduced as an alternative method to measure the 'true' inversion charge in field effect transistors (FET). This method was used to extract the mobility in FETs with conventional and SiO 2/HfO2 dual layer gate dielectrics. Results indicated that the inversion charge in metal oxide semiconductor field effect transistors could be directly measured by a variant of the charge pumping technique in long channel devices.
R. Ludeke, M.T. Cuberes, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
C. Choi, E. Cartier, et al.
Microelectronic Engineering
K. Zhao, J.H. Stathis, et al.
IRPS 2011
L.Å. Ragnarsson, N.A. Bojarczuk, et al.
IEEE Electron Device Letters