Conference paper
Learning Reduced Order Dynamics via Geometric Representations
Imran Nasim, Melanie Weber
SCML 2024
Paper
Distortion of masks for x-ray lithography
Abstract
Experimental and theoretical results are presented on the determination of distortion induced during the process of fabrication of X-ray lithography masks. The studies were performed on B-doped Si and on B-N-H mask substrates. © 1985.
Related
M. Hargrove, S.W. Crowder, et al.
IEDM 1998
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
T. Schneider, E. Stoll
Physical Review B