Distortion of masks for x-ray lithography

R.E. Acosta; J.R. Maldonado; R. Fair; R. Viswanathan; A.D. Wilson

doi:10.1016/0167-9317(85)90076-0

Microelectronic Engineering

Paper

01 Jan 1985

Distortion of masks for x-ray lithography

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Abstract

Experimental and theoretical results are presented on the determination of distortion induced during the process of fabrication of X-ray lithography masks. The studies were performed on B-doped Si and on B-N-H mask substrates. © 1985.

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