Conference paperApplication of semiconductor lithography to the fabrication of oligonucleotide arraysG.M. Wallraff, Jeff W. Labadie, et al.IS&T Annual Conference 1996
Conference paperMultiphase imide block copolymers: New materials for microelectronics applicationsJeff W. Labadie, J.L. HedrickECTC 1990
PaperResolution and etch resistance of a family of 193 nm positive resistsR.D. Allen, I.Y. Wan, et al.J. Photopolym. Sci. Tech.
Conference paperRelationship of photoacid production and fluorescence quenching of anthryl sensitizers by aryl iodonium and sulfonium saltsG.M. Wallraff, D.R. McKean, et al.ACS PMSE 1989