J.-C. Baumert, G.C. Bjorklund, et al.
CLEO 1987
We report on the excimer laser-induced photoablation of some organosilane polymers utilizing quartz microbalance techniques to monitor the nature of the ablation phenomenon. A fluence threshold for the ablation process is identified beyond which the material removal rate depends nonlinearly on the adsorbed laser fluence. Below this threshold, photo-oxidation of the polymer is observed as evidenced by mass uptake of the film. Our results suggest that photoablation of the polysilanes studied is a result of a combination of thermal and photochemical processes.
J.-C. Baumert, G.C. Bjorklund, et al.
CLEO 1987
W.E. Moerner, M. Gehrtz, et al.
CLEO 1985
R.D. Miller, D.R. McKean
Tetrahedron Letters
R.D. Miller, V.Y. Lee, et al.
Journal of the Chemical Society, Chemical Communications