W.D. Hinsberg, F.A. Houle, et al.
Microlithography 2000
We present a method of resolving the nuclear and electronic contributions to the third-order susceptibility χ3 in a phase conjugation experiment. The technique is applied to octylmethylpolysilane yielding χ3 (electronic)=(1.8±0.5)×10-12 esu and χ3(nuclear)=(1.1±0.4) ×10-12 esu at 532 nm.
W.D. Hinsberg, F.A. Houle, et al.
Microlithography 2000
G.M. Wallraff, R.D. Miller, et al.
J. Photopolym. Sci. Tech.
R.D. Miller, G.M. Wallraff, et al.
SPE Regional Technical Conference 1988
G.M. Wallraff, J.L. Hedrick, et al.
ACS Spring 1991