Julien Autebert, Aditya Kashyap, et al.
Langmuir
An apparatus for deep-ultraviolet interferometric lithography is described, in which the interfering beams illuminate the substrate through a fused silica prism and a layer of index-matching liquid. The liquid-immersion technique was found to be compatible with a commercially available, chemically amplified photoresist. The apparatus was used with a 257 nm light source to write gratings having a period of 97 nm and linewidth of approximately 40 nm. © 1999 American Vacuum Society.
Julien Autebert, Aditya Kashyap, et al.
Langmuir
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
M. Hargrove, S.W. Crowder, et al.
IEDM 1998