American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Conference paper

01 Mar 1998

Microlithographic applications of silicon-containing polymers and individual organosilicon compounds

Paper

A comparison of the E-beam and UV-sensitivities and relative O₂- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups

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Microelectronic Engineering

Paper

Mechanism of oxygen plasma etching of polydimethyl siloxane films

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Conference paper

Multilayer resist systems using polysiloxanes as etch masks

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Microlithography 1983

Paper

A comparison of the E-beam sensitivities and relative O₂-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers

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Microelectronic Engineering

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