American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

Conference paper

01 Mar 1998

Microlithographic applications of silicon-containing polymers and individual organosilicon compounds

Paper

X-ray photoelectron and infrared spectroscopy of microwave plasma etched polyimide surfaces

N.J. Chou, J. Paraszczak, et al.

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Conference paper

Chemical and physical aspects of multilayer resist processing

J. Paraszczak, E. Babich, et al.

Proceedings of SPIE 1989

Conference paper

Silylation of (photo)resist materials using polyfunctional organosilicon compounds

E. Babich, J. Paraszczak, et al.

ACS National Meeting 1989

Paper

A comparison of the E-beam sensitivities and relative O₂-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers

E. Babich, J. Paraszczak, et al.

Microelectronic Engineering

View all publications