Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry
The integration of a new aqueous clean, dSP+, has been demonstrated for aluminum interconnect technology in advanced DRAM products. The dSP+ chemistry was targeted for two back-end-of-line (BEOL) applications: post Al RIE clean and via clean. The results in this paper are discussed using SEM, reliability, and electrical parametric data.
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry
R. Ghez, J.S. Lew
Journal of Crystal Growth
Douglass S. Kalika, David W. Giles, et al.
Journal of Rheology
P.C. Pattnaik, D.M. Newns
Physical Review B