Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Paper
Physical and chemical mechanisms in the ion-enhanced etching of silicon
Abstract
No abstract available.
Related
Peter J. Price
Surface Science
A. Gangulee, F.M. D'Heurle
Thin Solid Films
J.K. Gimzewski, T.A. Jung, et al.
Surface Science