Jeff Gambino, Timothy D. Sullivan, et al.
MRS Spring Meeting 2007
The use of state-of-the-art microelectronic devices in space radiation environments faces new challenges with the adoption of low dielectric constant (low-k) materials as interlevel dielectrics. This is demonstrated in a preliminary study of methyl-silsesquioxane low-k films. We report radiation damage, induced by a 2-kev low- current.density (∼ 2 × 106 s-1cm-2) positron beam, and observed by positron annihilation spectroscopy.
Jeff Gambino, Timothy D. Sullivan, et al.
MRS Spring Meeting 2007
Mihail P. Petkov, Marc H. Weer, et al.
Applied Physics Letters
Michael S. Gordon, David F. Heidel, et al.
IEEE TNS
James R. Schwank, Marty R. Shaneyfelt, et al.
IEEE TNS