S. Gates, C.M. Greenlief, et al.
The Journal of Chemical Physics
The reactive sticking coefficient, SR, of SiH4 on the Si (111)-(7×7) surface has been studied as a function of hydrogen coverage (ΘH) in the temperature range from 100 to 500 °C. Evidence is seen for two adsorption regimes which are proposed to correspond to minority and majority surface sites. On the minority sites (ΘH=0 to 0.08), SR is approximately 10-5 and essentially no dependence of SR on surface temperature, TS, is found. Reactive sticking becomes a complicated function of TS and ΘH, with SR decreasing, on the majority sites (ΘH≫008). © 1989.
S. Gates, C.M. Greenlief, et al.
The Journal of Chemical Physics
D.D. Koleske, S. Gates, et al.
Applied Physics Letters
F.R. McFeely, J.A. Yarmoff, et al.
Surface Science
D.B. Beach, R.T. Collins, et al.
MRS Proceedings 1992