K. Zhao, J.H. Stathis, et al.
IRPS 2010
The anomalous properties of defect centers observed by Warren and Lenahan (ref. 1), in certain plasma enhanced chemical vapor deposited silica films must be examined in a broader light. The presence of a compensating impurity is indicated.(AIP).
K. Zhao, J.H. Stathis, et al.
IRPS 2010
J. Batey, E. Tierney, et al.
Applied Surface Science
S. Krishnan, U. Kwon, et al.
IEDM 2011
G. Ribes, P. Mora, et al.
IRPS 2010