D.J. DiMaria, M.V. Fischetti, et al.
Physical Review Letters
The anomalous properties of defect centers observed by Warren and Lenahan (ref. 1), in certain plasma enhanced chemical vapor deposited silica films must be examined in a broader light. The presence of a compensating impurity is indicated.(AIP).
D.J. DiMaria, M.V. Fischetti, et al.
Physical Review Letters
E. Cartier, J.H. Stathis
Microelectronic Engineering
J. Batey, E. Tierney
Journal of Applied Physics
Ernest Y. Wu, B. Li, et al.
IEDM 2013