Reactivity of a fluorine passivated silicon surface
Ruud A. Haring, Michael Liehr
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
The fundamental surface chemistry underlying selectivity in copper chemical vapor deposition (CVD) from COD-Cu-hfac and Cu(hfac)2 has been determined. Both electronic and chemistry contributions strongly influence the precursor reactivity on oxide as compared to metal surfaces. These results have important implications regarding the role of surface preparation and cleaning for initiating and maintaining selective deposition.
Ruud A. Haring, Michael Liehr
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Susan L. Cohen, Michael Liehr, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Susan L. Cohen, Michael Liehr, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Zhaoying Hu, Jose Miguel M. Lobez Comeras, et al.
Nature Nanotechnology