Preoxidation Si cleaning and its impact on metal oxide semiconductor characteristics
- S.R. Kasi
- M. Liehr
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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12 results for S.R. Kasi
Surface analysis studies of copper chemical vapor deposition from 1,5-cyclooctadiene-copper(l)-hexafluoroacetylacetonate
- Susan L. Cohen
- Michael Liehr
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
HF and UV-ozone integrated wafer preclean: chemistry and effects on thermal gate oxide
- M. Liehr
- S.R. Kasi
- 1991
- SSDM 1991
Role of surface passivation in the integrated processing of MOS structures
- M. Offenberg
- M. Liehr
- et al.
- 1990
- VLSI Technology 1990
HF surface passivation failure in integrated thermal oxidation processing
- M. Liehr
- M. Offenberg
- et al.
- 1990
- SSDM 1990
Selectivity in copper chemical vapor deposition
- Susan L. Cohen
- Michael Liehr
- et al.
- 1992
- Applied Physics Letters
Mechanisms of copper chemical vapor deposition
- Susan L. Cohen
- Michael Liehr
- et al.
- 1992
- Applied Physics Letters
Chemistry of fluorine in the oxidation of silicon
- S.R. Kasi
- M. Liehr
- et al.
- 1991
- Applied Physics Letters
Hydrocarbon reaction with HF-cleaned Si(100) and effects on metal-oxide-semiconductor device quality
- S.R. Kasi
- M. Liehr
- et al.
- 1991
- Applied Physics Letters
Kinetics of silicon epitaxy using SiH4 in a rapid thermal chemical vapor deposition reactor
- M. Liehr
- C.M. Greenlief
- et al.
- 1990
- Applied Physics Letters