Designing a testable System on a Chip
- S.V. Kosonocky
- A.A. Bright
- et al.
- 1998
- VTS 1998
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30 results for A.A. Bright
Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography
- R. Viswanathan
- David Seeger
- et al.
- 1994
- Microelectronic Engineering
Chemical and electrical properties of interfaces between deposited insulators and La2CuO4
- A. Levy
- M.J. Lercel
- et al.
- 1992
- Journal of Applied Physics
Use of electron-beam charging for in-process inspection of silicide complementary metal-oxide-semiconductor gate electrode isolation
- Keith A. Jenkins
- P. Agnello
- et al.
- 1992
- Applied Physics Letters
Low-rate plasma oxidation of Si in a dilute oxygen/helium plasma for low-temperature gate quality Si/SiO2 interfaces
- A.A. Bright
- J. Batey
- et al.
- 1991
- Applied Physics Letters
Helium plasma enhanced chemical vapor deposited oxides and nitrides: Process mechanisms and applications in advanced device structures
- A.A. Bright
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
High-Mobility Modulation-Doped Graded Sige-Channel P-Mosfet's
- Sophie Verdonckt-Vandebroek
- Emmanuel F. Crabbé
- et al.
- 1991
- IEEE Electron Device Letters
A metal-oxide-semiconductor field-effect transistor with a 20-nm channel length
- A. Hartstein
- N.F. Albert
- et al.
- 1990
- Journal of Applied Physics
SiGe-base PNP transistors fabricated with N-type UHV/CVD LTE in a 'No Dt' process
- D.L. Harame
- J.M.C. Stork
- et al.
- 1990
- VLSI Technology 1990
Characteristics of CMOS devices fabricated using high quality thin PECVD gate oxide
- L.K. Wang
- D.S. Wen
- et al.
- 1989
- IEDM 1989