Mass spectrometric studies of remote helium plasma dissociation of silane
- Joseph M. Jasinski
- 1995
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Direct Kinetic Studies of Silicon Hydride Radicals in the Gas Phase
- J.M. Jasinski
- R. Becerra
- et al.
- 1995
- Chemical Reviews
Gas phase and gas surface kinetics of transient silicon hydride species
- J.M. Jasinski
- 1993
- MRS Fall Meeting 1993
Formation of gas-phase silyl radicals in the atomic hydrogen etching of silicon
- Joseph M. Jasinski
- 1993
- Chemical Physics Letters
Surface loss coefficients for the silyl radical
- Joseph M. Jasinski
- 1993
- Journal of Physical Chemistry
Observation and characterization of near-UV transients formed in disilane photodissociation at 193 nm
- Joseph M. Jasinski
- 1991
- Chemical Physics Letters
Direct kinetic studies of SiH3+SiH3, H, CCl 4, SiD4, Si2H6, and C 3H6 by tunable infrared diode laser spectroscopy
- S.K. Loh
- J.M. Jasinski
- 1991
- The Journal of Chemical Physics
Theoretical studies of neutral silane-ammonia adducts
- A.R. Rossi
- J.M. Jasinski
- 1990
- Chemical Physics Letters
Absolute rate constants for the reaction of silyl with nitric oxide, ethylene, propyne, and propylene, and the silyl recombination reaction
- S.K. Loh
- D.B. Beach
- et al.
- 1990
- Chemical Physics Letters
Calculation of unimolecular rate constants for common metalorganic vapor phase epitaxy precursors via RRKM theory
- N.I. Buchan
- J.M. Jasinski
- 1990
- Journal of Crystal Growth