Plasma-Enhanced Photoemission Detection: A New Method for Real-Time Surface Monitoring During Plasma Processing
- J. Singh
- 1989
- IEEE JQE
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25 results for G.S. Selwyn
LASER SPECTROSCOPY IN ELECTRONIC MATERIALS PROCESSING RESEARCH.
- R.W. Dreyfus
- J.M. Jasinski
- et al.
- 1986
- Laser Focus (Littleton, Massachusetts)
Spatially resolved optical emission studies of fluorocarbon RF plasma through the use of UV-transmitting optical fibers
- G.S. Selwyn
- E. Kay
- 1985
- Plasma Chemistry and Plasma Processing
Studies of atomic oxygen in O2+CF4 rf discharges by two-photon laser-induced fluorescence and optical emission spectroscopy
- R.E. Walkup
- K.L. Saenger
- et al.
- 1985
- The Journal of Chemical Physics
Laser detection of diatomic products of plasma sputtering and etching
- R.E. Walkup
- Ph. Avouris
- et al.
- 1984
- Applied Physics Letters