On the effects of implantation of ions in the MeV energy range into silicon
- L.K. Wang
- C.T. Chuang
- et al.
- 1986
- Solid-State Electronics
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35 results for L.K. Wang
Thermal stability of TiSi2 on mono- and polycrystalline silicon
- C.Y. Wong
- L.K. Wang
- et al.
- 1986
- Journal of Applied Physics
Electron beam / optical mixed lithography at half-micron ground rules
- P. Coane
- P. Rudeck
- et al.
- 1986
- Microelectronic Engineering
HIGHLY LATCHUP-IMMUNE 1- mu m CMOS TECHNOLOGY FABRICATED WITH 1 Mev ION IMPLANTATION AND SELF-ALIGNED TiSi//2.
- F.S. Lai
- L.K. Wang
- et al.
- 1984
- IEDM 1984
EFFECTS OF MeV IMPLANTATION ON THE CHARACTERISTICS OF p-n JUNCTIONS.
- L.K. Wang
- G.P. Li
- et al.
- 1984
- ECS Meeting 1984