Latent image measurements in electron beam exposed polymethylmethacrylate
- Jerry C. Shaw
- Stephen A. Rishton
- et al.
- 1991
- Applied Physics Letters
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49 results for S. Rishton
Hysteresis in lithographic arrays of permalloy particles: Experiment and theory (invited)
- J.F. Smyth
- S. Schultz
- et al.
- 1991
- Journal of Applied Physics
New High-Resolution and High-Sensitivity Deep UV, X-Ray, and Electron-Beam Resists
- M. Hatzakis
- K.J. Stewart
- et al.
- 1991
- JES
A study of proximity effects at high electron-beam voltages for x-ray mask fabrication part 1: Additive mask processes
- Michael G. Rosenfield
- S. Rishton
- et al.
- 1991
- Microelectronic Engineering
New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
- Michael Hatzakis
- Kevin J. Stewart
- et al.
- 1990
- Microelectronic Engineering
Scanning capacitance microscopy on a 25 nm scale
- C.C. Williams
- W.P. Hough
- et al.
- 1989
- Applied Physics Letters
On the preparation of cross-sectional TEM samples using lithographic processing and reactive ion-etching
- J.T. Wetzel
- M. Jost
- et al.
- 1989
- Ultramicroscopy
A comparison of the E-beam sensitivities and relative O2-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- E. Babich
- J. Paraszczak
- et al.
- 1989
- Microelectronic Engineering
Electron beam lithography of sub-0.1μm circuits
- S. Rishton
- D. Kern
- et al.
- 1989
- Microelectronic Engineering