Method of measuring the spatial resolution of a photoresist
- J. Hoffnagle
- W.D. Hinsberg
- et al.
- 2002
- Optics Letters
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80 results for J. Hoffnagle
Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High NA lithographic imagery at Brewster's angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
High numerical aperture-imaging implications for chemically amplified photoresists
- Martha I. Sanchez
- Frances A. Houle
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Measured performance of a refractive Gauss-to-flattop reshaper for deep-UV through near-IR wavelengths
- John A. Hoffnagle
- C. Michael Jefferson
- 2001
- SPIE Optical Science and Technology 2001
Volume holographic data storage at an areal density of 250 gigapixels/in.2
- Geoffrey W. Burr
- C. Michael Jefferson
- et al.
- 2001
- Optics Letters
Dynamic holograms as phase-conjugate buffers for digital volume holographic data storage
- Geoffrey W. Burr
- Hans Coufal
- et al.
- 2001
- OC 2001
Progress in read-write fast-access volume holographic data storage
- Geoffrey W. Burr
- Erwin Mecher
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume holographic data storage at an areal density of 100 Gbit/in2
- G.W. Burr
- C.M. Jefferson
- et al.
- 2000
- CLEO 2000