A Scaled 0.25- μm Bipolar Technology Using Full e-Beam Lithography
- John D. Cressler
- James Warnock
- et al.
- 1992
- IEEE Electron Device Letters
Publications
Date
Featured collections
Popular topics
13 results for M.G.R. Thomson
A full E-beam 0.25 mu m bipolar technology with sub-25 ps ECL gate delay
- J. Warnock
- J.D. Cressler
- et al.
- 1991
- IEDM 1991
Lithographic performance of an EL-3 system at 0.25μm groundrules
- T. Newman
- M.G.R. Thomson
- et al.
- 1991
- Microelectronic Engineering