Electrical integrity of state-of-the-art 0.13 μm SOI CMOS devices and circuits transferred for three-dimensional (3D) integrated circuit (IC) fabricationK.W. GuariniA. Topolet al.2002IEDM 2002
A high-speed, high-sensitivity silicon lateral trench photodetectorMin YangKern Rimet al.2002IEEE Electron Device Letters
Characteristics and device design of sub-100 nm strained Si N- and PMOSFETsK. RimJ.O. Chuet al.2002VLSI Technology 2002
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Triple-self-aligned, planar double-gate MOSFETs: Devices and circuitsK.W. GuariniP. Solomonet al.2001Technical Digest-International Electron Devices Meeting