Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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15 results for A. Carr

External Resistance Reduction by Nanosecond Laser Anneal in Si/SiGe CMOS Technology
- - Oleg Gluschenkov
  - Heng Wu
  - et al.
- 2018
- IEDM 2018
Parasitic Resistance Reduction Strategies for Advanced CMOS FinFETs beyond 7nm
- - Heng Wu
  - Oleg Gluschenkov
  - et al.
- 2018
- IEDM 2018
Integrated dual SPE processes with low contact resistivity for future CMOS technologies
- - Heng Wu
  - Soon-Cheon Seo
  - et al.
- 2017
- IEDM 2017
Self-Allancd Gate Contact (SAGC) for CMOS technology scaling beyond 7nm
- - Ruilong Xie
  - Chanro Park
  - et al.
- 2019
- VLSI Technology 2019
Study of titanium nitride underlayer properties and its influence on tungsten growth
- - Shanti Pancharatnam
  - J. Wynne
  - et al.
- 2018
- ASMC 2018
Highly-selective superconformai CVD Ti silicide process enabling area-enhanced contacts for next-generation CMOS architectures
- - Nicolas Breil
  - A. Carr
  - et al.
- 2017
- VLSI Technology 2017
Dual beam laser annealing for contact resistance reduction and its impact on VLSI integrated circuit variability
- - Zuoguang Liu
  - Oleg Gluschenkov
  - et al.
- 2017
- VLSI Technology 2017
Contacts in advanced CMOS: History and emerging challenges
- - Christian Lavoie
  - Praneet Adusumilli
  - et al.
- 2017
- ECS Meeting 2017 - New Orleans
Formation and microstructure of thin Ti silicide films for advanced technologies
- - Praneet Adusumilli
  - A. Carr
  - et al.
- 2016
- IITC/AMC 2016
Tungsten and cobalt metallization: A material study for MOL local interconnects
- - Vimal Kamineni
  - Mark Raymond
  - et al.
- 2016
- IITC/AMC 2016