Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
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39 results for Linda K. Sundberg
Sub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Templating organosilicate vitrification using unimolecular self-organizing polymers prepared from tandem ring opening and atom transfer radical polymerizations
- T. Magbitang
- V.Y. Lee
- et al.
- 2004
- Macromolecular Symposia
Optimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
Liquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Porous organosilicates low-dielectric films for high-frequency devices
- André Knoesen
- Ge Song
- et al.
- 2004
- Journal of Electronic Materials
Templating of silsesquioxane cross-linking using unimolecular self-organizing polymers
- Eric F. Connor
- Linda K. Sundberg
- et al.
- 2003
- Angewandte Chemie - International Edition
Versatile synthesis of nanometer sized hollow silica spheres
- Jeroen J. L. M. Cornelissen
- Eric F. Connor
- et al.
- 2003
- Chemical Communications