Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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119 results for Stephan A. Cohen

Short Time Annealing of Coevaporated Tungsten Silicide Films
- - T.O. Sedgwick
  - F.M. d'Heurle
  - et al.
- 2019
- JES
Electrical Properties of Chemical-Mechanical Polished Tetraethyl Orthosilicate Films with and Without Capping Layers
- - S. Cohen
  - M.A. Jaso
  - et al.
- 2019
- JES
Extreme-low k porous pSiCOH dielectrics prepared by PECVD
- - H. You
  - Petra Mennell
  - et al.
- 2018
- JVSTB
Low hydrogen silicon carbon nitride cap for high performance sub-10 nm Cu-low k interconnect
- - Son Van Nguyen
  - Shobha Hosadugra
  - et al.
- 2017
- ECS J. Solid State Sci. Technol.
Advanced single precursor based pSiCOH k = 2.4 for ULSI interconnects
- - Deepika Priyadarshini
  - Son Van Nguyen
  - et al.
- 2017
- JVSTB
Detection of charge carrier confinement into mobile ionic defects in nanoporous dielectric films for advanced interconnects
- - Juan Borja
  - Joel L. Plawsky
  - et al.
- 2014
- JVSTA
Effect of low-frequency radio frequency on plasma-enhanced chemical vapor deposited ultra low-κ dielectric films for very large-scale integrated interconnects
- - E. T. Todd Ryan
  - Stephen M. Gates
  - et al.
- 2014
- Journal of Applied Physics
Contamination mitigation of hydrogen silsesquioxane resist processed with Na⁺-containing developer for nanoscale CMOS device patterning
- - Markus Brink
  - Isaac Lauer
  - et al.
- 2014
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Effective Cu surface pre-treatment for high-reliable 22 nm-node Cu dual damascene interconnects with high plasma resistant ultra low-k dielectric (k = 2.2)
- - F. Ito
  - H. Shobha
  - et al.
- 2012
- Microelectronic Engineering
Processing and moisture effects on TDDB for Cu/ULK BEOL structures
- - E. Liniger
  - T.M. Shaw
  - et al.
- 2012
- Microelectronic Engineering