Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

Date

Start

End

Featured collections

Popular topics

34 results for Oleg Gluschenkov

Sub-10^-9 Ω-cm² n-Type Contact Resistivity for FinFET Technology
- - Hiroaki Niimi
  - Zuoguang Liu
  - et al.
- 2016
- IEEE Electron Device Letters
Performance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO₂ gate dielectrics
- - Min Yang
  - Evgeni P. Gusev
  - et al.
- 2003
- IEEE Electron Device Letters
Improving FinFET Junctions and Contacts via Laser Annealing
- - Oleg Gluschenkov
  - Yasir Sulehria
  - et al.
- 2023
- IWJT 2023
Impact of Nanosecond Laser Anneal on PVD Ru Films
- - D. Sil
  - Yasir Sulehria
  - et al.
- 2021
- IITC 2021
Energy density and temperature calibration for feol nanosecond laser annealing
- - Yasir Sulehria
  - Oleg Gluschenkov
  - et al.
- 2020
- ASMC 2020
Simulation of 3D Doping by Plasma Immersion Ion Implantation for FinFET or deep Trench Doping Applications. Effect of main Process Parameters and Study of Wall Doping Non-Uniformity as Function of Form Factor and Device Scaling
- - Frank Torregrosa
  - Benjamin Roux
  - et al.
- 2018
- IIT 2018
Laser annealing in CMOS manufacturing
- - Oleg Gluschenkov
  - H. Jagannathan
- 2018
- ECS Meeting 2018
Dual beam laser annealing for contact resistance reduction and its impact on VLSI integrated circuit variability
- - Zuoguang Liu
  - Oleg Gluschenkov
  - et al.
- 2017
- VLSI Technology 2017
Process optimizations for NBTI/PBTI for future replacement metal gate technologies
- - Barry P. Linder
  - A. Dasgupta
  - et al.
- 2016
- IRPS 2016
Characterization and mitigation of overlay error on silicon wafers with nonuniform stress
- - T.A. Brunner
  - V. Menon
  - et al.
- 2014
- SPIE Advanced Lithography 2014