Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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193 results for Vijay Narayanan

Epitaxial strontium oxide layers on silicon for gate-first and gate-last TiN/HfO₂ gate stack scaling
- - Martin M. Frank
  - Chiara Marchiori
  - et al.
- 2011
- Microelectronic Engineering
High temperature (1000°C) compatible Y-La-Si-O silicate gate dielectric in direct contact with Si with 7.7 Å equivalent oxide thickness
- - Catherine Dubourdieu
  - E. Cartier
  - et al.
- 2011
- Applied Physics Letters
Millisecond flash annealing as a flatband voltage shift enabler for p-type metal-oxide-semiconductor devices with high-k/metal gate
- - Changhwan Choi
  - Vijay Narayanan
- 2011
- Electrochemical and Solid-State Letters
Impact of diffusionless anneal using dynamic surface anneal on the electrical properties of a high-k/metal gate stack in metal-oxide-semiconductor devices
- - Changhwan Choi
  - Kam-Leung Lee
  - et al.
- 2011
- Applied Physics Letters
Ruthenium based metals using atomic vapor deposition for gate electrode applications
- - Changhwan Choi
  - Takashi Ando
  - et al.
- 2011
- Applied Physics Letters
Epitaxial SrO interfacial layers for HfO₂ -Si gate stack scaling
- - Chiara Marchiori
  - Martin M. Frank
  - et al.
- 2011
- Applied Physics Letters
Physical origins of mobility degradation in extremely scaled SiO ₂ / HfO₂ gate stacks with la and Al induced dipoles
- - Takashi Ando
  - Matt Copel
  - et al.
- 2010
- Applied Physics Letters
Temperature-dependent La- and Al-induced dipole behavior monitored by femtosecond pump/probe photoelectron spectroscopy
- - Hiroaki Arimura
  - Richard Haight
  - et al.
- 2010
- Applied Physics Letters
Oxygen migration in TiO₂-based higher-k gate stacks
- - Sangbum Kim
  - Stephen L. Brown
  - et al.
- 2010
- Journal of Applied Physics
Interaction of La₂O₃ capping layers with HfO ₂ gate dielectrics
- - M. Copel
  - S. Guha
  - et al.
- 2009
- Applied Physics Letters