Hydrogen Barrier Layer Against Silicon Oxidation during Atomic Layer Deposition of Al2 O3 and Hf O2
- Martin M. Frank
- Yu Wang
- et al.
- 2007
- JES
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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Advanced high-κ dielectric stacks with polySi and metal gates: Recent progress and current challenges
- Evgeni P. Gusev
- Vijay Narayanan
- et al.
- 2006
- IBM J. Res. Dev
Hafnium oxide gate dielectrics on sulfur-passivated germanium
- Martin M. Frank
- Steven J. Koester
- et al.
- 2006
- Applied Physics Letters
Germanium channel MOSFETs: Opportunities and challenges
- Huiling Shang
- Martin M. Frank
- et al.
- 2006
- IBM J. Res. Dev
Absence of magnetism in hafnium oxide films
- 2005
- Applied Physics Letters
Sub-bandgap defect states in polycrystalline hafnium oxide and their suppression by admixture of silicon
- N.V. Nguyen
- Albert V. Davydov
- et al.
- 2005
- Applied Physics Letters
Hf O 2 and Al 2 O 3 gate dielectrics on GaAs grown by atomic layer deposition
- Martin M. Frank
- Glen D. Wilk
- et al.
- 2005
- Applied Physics Letters
Gas phase chlorination of hydrogen-passivated silicon surfaces
- Sandrine Rivillon
- Fabrice Amy
- et al.
- 2004
- Applied Physics Letters
Surface reactivity of Pd nanoparticles supported on polycrystalline substrates as compared to thin film model catalysts: Infrared study of CO adsorption
- Serena Bertarione
- Domenica Scarano
- et al.
- 2004
- Journal of Physical Chemistry B
Metallic contact formation for molecular electronics: Interactions between vapor-deposited metals and self-assembled monolayers of conjugated mono- and dithiols
- Bert De Boer
- Martin M. Frank
- et al.
- 2004
- Langmuir