Reactive diffusion in the Ni-Si system: Influence of Ni thickness on the phase formation sequence
- C. Coïa
- C. Lavoie
- et al.
- 2005
- ECS Meeting 2005
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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193 results for Christian Lavoie
Applications of synchrotron X-rays in microelectronics industry research
- Jean L. Jordan-Sweet
- Christophe Detavernier
- et al.
- 2005
- Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Reactive diffusion in the Ni-Si system: Phase sequence and formation of metal-rich phases
- C. Lavoie
- C. Coia
- et al.
- 2004
- DIMAT 2004
Texture of suicide films on Si(001) : The occurrence of axiotaxy in cubic CoSi 2, tetragonal α-FeSi 2 and orthorhombic NiSi
- C. Detavernier
- C. Lavoie
- 2004
- ICSICT 2004
Towards implementation of a nickel silicide process for CMOS technologies
- C. Lavoie
- F.M. D'Heurle
- et al.
- 2003
- Microelectronic Engineering
Kinetics of agglomeration of NiSi and NiSi2 phase formation
- C. Detavernier
- A.S. Özcan
- et al.
- 2002
- MRS Proceedings 2002
Influence of substrate temperature during sputter deposition on the subsequent formation of titanium disilicide
- A.S. Özean
- K.F. Ludwig Jr.
- et al.
- 2002
- MRS Proceedings 2002
In-situ studies of silicide formation in Ti-Ta bilayer thin films on poly-Si
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- MRS Proceedings 2002
The growth of tantalum thin films by plasma-enhanced atomic layer deposition and diffusion barrier properties
- H. Kim
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002
A self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperature
- G.M. Cohen
- C. Cabral Jr.
- et al.
- 2002
- MRS Proceedings 2002