High-speed aqueous-developing negative resist based on triflic-acid-catalyzed epoxy polymerization
- R.D. Allen
- Willard E. Conley
- et al.
- 1992
- Microlithography 1992
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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99 results for Robert Allen
Polymer effects on the photochemistry of triarylsulfonium salts
- D.R. McKean
- R.D. Allen
- et al.
- 1991
- SPIE San Diego 1991
Top-surface-imaging resist for deep UV lithography
- Scott A. MacDonald
- H. Schlosser
- et al.
- 1991
- International Technical Conference on Photopolymers 1991
Silicon-rich surfaces in polymer resists
- R.D. Allen
- Scott A. MacDonald
- 1989
- International SAMPE Electronics Conference 1989
Investigations on the structural morphology of sulfonium salt containing polymethacrylate films
- R.D. Allen
- U. Schaedeli
- et al.
- 1989
- ACS PMSE 1989
Silicon oxidation during bilayer resist etching
- Mark A. Hartney
- Justin N. Chiang
- et al.
- 1989
- Proceedings of SPIE 1989
Novel photoresist design based on electrophilic aromatic substitution
- B. Reck
- R.D. Allen
- et al.
- 1988
- SPE Regional Technical Conference 1988
A 2-layer resist system derived from trimethylsilylstyrene
- S.A. Macdonald
- R.D. Allen
- et al.
- 1989
- Proceedings of SPIE 1989
Leveraging resist chemistry research for water purification membrane technology
- Robert D. Allen
- Young-Hye Na
- et al.
- 2010
- J. Photopolym. Sci. Tech.
Investigation of polymer-bound PAGs: Synthesis, characterization and initial structure/property relationships of anion-bound resists
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2009
- J. Photopolym. Sci. Tech.