IBM 193nm semiconductor resist: Material properties, resist characteristics and lithographic performance
- P. Rao Varanasi
- Ann Marie Mewherter
- et al.
- 1999
- J. Photopolym. Sci. Tech.
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99 results for Robert Allen
Diffusion and distribution studies of photoacid generators: Ion beam analysis in lithography
- Narayan Sundararajan
- Christopher F. Keimel
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Platform-dependent properties of 193nm single layer resists
- Robert D. Allen
- Thomas I. Wallow
- et al.
- 1998
- J. Photopolym. Sci. Tech.
The influence of photoacid structure on the design and performance of 193-nm resists
- Robert D. Allen
- Juliann Opitz
- et al.
- 1997
- J. Photopolym. Sci. Tech.
Progress in 193 nm positive resists
- R.D. Allen
- R. Soortyakumaran
- et al.
- 1996
- J. Photopolym. Sci. Tech.
193 nm photoresist r&d: the risk & challenge
- Donald C. Hofer
- Robert Allen
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Resolution and etch resistance of a family of 193 nm positive resists
- R.D. Allen
- I.Y. Wan
- et al.
- 1995
- J. Photopolym. Sci. Tech.
Designing high performance KrF and ArF single layer resists with methacrylate polymers
- Robert D. Allen
- Gregory M. Wallraff
- et al.
- 1993
- J. Photopolym. Sci. Tech.
Amine-functionalized, multi-arm star polymers: A novel platform for removing glyphosate from aqueous media
- Lianna Samuel
- Ran Wang
- et al.
- 2017
- Chemosphere
Thermal probe maskless lithography for 27.5 nm half-pitch Si technology
- Lin Lee Cheong
- Philip Paul
- et al.
- 2013
- Nano Letters